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Carbon Nanotube Field-Effect Transistors for High-Performance Digital Circuits—DC Analysis and Modeling Toward Optimum Transistor Structure

by: A Raychowdhury, A Keshavarzi, J Kurtin, V De, K Roy
Electron Devices, IEEE Transactions on, Vol. 53, No. 11. (2006), pp. 2711-2717.


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Scaling of silicon technology continues while a research has started in other novel materials for future technology generations beyond year 2015. Carbon nanotubes (CNTs) with their excellent carrier mobility are a promising candidate. The authors investigated different CNT-based field effect transistors (CNFETs) for an optimal switch. Schottky-barrier (SB) CNFETs, MOS CNFETs, and state-of-the-art Si MOSFETs were systematically compared from a circuit/system design perspective. The authors have performed a dc analysis and determined how noise margin and voltage swing vary as a function of tube diameter and power-supply voltage. The dc analysis of single-tube SB CNFET transistors revealed that the optimum CNT diameter for achieving the best I<sub>ON</sub>-to-I<sub>OFF</sub> ratio while maintaining a good noise margin is about 1 to 1.5 nm. Despite several serious technological barriers and challenges, CNTs show a potential for future high-performance devices as they are being researched


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