Resonant Interferometric Lithography beyond the Diffraction Limit

@article{citeulike:2997012, abstract = {A novel approach for the generation of subwavelength structures in interferometric optical lithography is described. Our scheme relies on the preparation of the system in a position dependent trapping state via phase shifted standing wave patterns. Since this process only comprises resonant atom-field interactions, a multiphoton absorption medium is not required. The contrast of the induced pattern does only depend on the ratios of the applied field strengths such that our method in principle works at very low laser intensities.}, author = {Kiffner, M. and Evers, J. and Zubairy, M. S. }, citeulike-article-id = {2997012}, doi = {http://dx.doi.org/10.1103/PhysRevLett.100.073602}, journal = {Physical Review Letters}, keywords = {interference, lithography, quantum-optics}, number = {7}, posted-at = {2008-07-13 09:25:34}, priority = {2}, publisher = {APS}, title = {Resonant Interferometric Lithography beyond the Diffraction Limit}, url = {http://dx.doi.org/10.1103/PhysRevLett.100.073602}, volume = {100}, year = {2008} }

TY - JOUR ID - citeulike:2997012 L3 - citeulike-article-id:2997012 TI - Resonant Interferometric Lithography beyond the Diffraction Limit JF - Physical Review Letters VL - 100 IS - 7 PB - APS N2 - A novel approach for the generation of subwavelength structures in interferometric optical lithography is described. Our scheme relies on the preparation of the system in a position dependent trapping state via phase shifted standing wave patterns. Since this process only comprises resonant atom-field interactions, a multiphoton absorption medium is not required. The contrast of the induced pattern does only depend on the ratios of the applied field strengths such that our method in principle works at very low laser intensities. KW - interference KW - lithography KW - quantum-optics AU - Kiffner, M AU - Evers, J AU - Zubairy, MS PY - 2008/// UR - http://dx.doi.org/10.1103/PhysRevLett.100.073602 ER -