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zamberdine resist [3 articles]

Recent papers added to zamberdine library classified by the tag resist. You can also see everyone's resist.
  • Rational Design of High-RI Resists for 193nm Immersion Lithography
    Journal of Photopolymer Science, Vol. 20, No. 5., pp. 665-671.
    by Andrew K Whittaker, Idriss Blakey, Lan Chen, Bronwin Dargaville, Heping Liu, Will Conley, Paul A Zimmerman
    posted to 193nm immersion resist by zamberdine on 2007-09-24 14:19:19 as **
  • Synthesis of high refractive index sulfur containing polymers for 193 nm immersion lithography: a progress report
    Proceedings of SPIE, Vol. 6153 (2006)
    by Idriss Blakey, Will Conley, Graeme A George, David J Hill, Heping Liu, Firas Rasoul, Andrew K Whittaker
    posted to high immersion index polymer qspr refractive resist ri by zamberdine on 2007-09-24 13:54:28 as *****
  • The rational design of polymeric EUV resist materials by QSPR modelling
    Proceedings of SPIE, Vol. 6519 (2007)
    by Kevin Jack, Heping Liu, Idriss Blakey, David Hill, Wang Yueh, Heidi Cao, Michael Leeson, Greg Denbeaux, Justin Waterman, Andrew Whittaker
    edited by Qinghuang Lin
    posted to euv non-car resist by zamberdine on 2007-09-24 13:45:57 as *****
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